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Deposition of Organosilicon Polymer Thin Films by Plasma Enhanced Chemical Vapor Deposition
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SYSNO ASEP 0047572 Document Type H - Proceedings (Czech conf.) R&D Document Type Není vybrán druh dokumentu Title Deposition of Organosilicon Polymer Thin Films by Plasma Enhanced Chemical Vapor Deposition Title Depozice organosilikonových tenkých vrstev pomocí PECVD Author(s) Zajíčková, L. (CZ)
Buršíková, V. (CZ)
Sťahel, P. (CZ)
Buršík, Jiří (UFM-A) RID, ORCID
Peřina, Vratislav (UJF-V) RID
Macková, Anna (UJF-V) RID, ORCID, SAI
Dubroka, A. (CZ)Issue data Pardubice: Univerzita Pardubice, 2006 Number of pages 4 s. Action International Conference of Solid State Chemistry /7./ Event date 24.09.2006-29.09.2006 VEvent location Pardubice Country CZ - Czech Republic Event type WRD Language eng - English Country CZ - Czech Republic Keywords organosilicon polymers ; PECVD ; surface analyses Subject RIV BL - Plasma and Gas Discharge Physics CEZ AV0Z10480505 - UJF-V (2005-2011) AV0Z20410507 - UFM-A (2005-2011) Annotation doplnit Workplace Nuclear Physics Institute Contact Markéta Sommerová, sommerova@ujf.cas.cz, Tel.: 266 173 228 Year of Publishing 2007
Number of the records: 1