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Plasma Polymers and Related Materials
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SYSNO ASEP 0032087 Document Type M - Monograph Chapter R&D Document Type Monograph Chapter Title Treatment of Organosilicon Thin Films by Exposure to Different O2 Based Plasma and Afterglow Conditions Title Plazmové leptání organokřemíkových tenkých vrstev modifikovaných za různých podmínek aktivního a rozpadajícího se plazmatu Author(s) Supiot, P. (FR)
Macková, Anna (UJF-V) RID, ORCID, SAI
Vivien, C. (FR)
Granier, A. (FR)
Bousquet, CH. (FR)
Boufayed, F. (FR)
Escaich, D. (FR)
Raynoad, P. (FR)
Strýhal, Z. (CZ)
Pavlík, Josef (ENTU-I)Source Title Plasma Polymers and Related Materials, Thin Films by Exposure to Different O2 Based Plasma and Afterglow Conditions. - Ankara : Hacettepe University Press, 2005 - ISBN 975-491-194-0 Pages s. 53-58 Number of pages 6 s. Language eng - English Country TR - Turkey Keywords organosilicon ; PACVD ; PECVD ; RBS analysis Subject RIV BL - Plasma and Gas Discharge Physics R&D Projects OC 527.100 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) 1P05OC014 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) CEZ AV0Z10480505 - UJF-V (2005-2011) Annotation The aim of this study is to investigate the transformation of organosilicon plasma polymer films (500 nm thick) upon exposure to oxygen rich plasmas and after-glow. Different organosilicon films (Si, O, C, H) deposited on silicon in RF inductively coupled, microwave distributed electron cyclotron resonance and microwave induced remote afterglow reactors, are considered. The analysis of the effect of these teratments which are achieved in the same reactors is done through a RBS study. The organic films are partially transformed into a inorganic SiOx – like film, but the effects are shown to be quite different according to both the deposition process and post-treatment conditions. Workplace Nuclear Physics Institute Contact Markéta Sommerová, sommerova@ujf.cas.cz, Tel.: 266 173 228 Year of Publishing 2006
Number of the records: 1