Number of the records: 1
Semiconducting p-type copper iron oxide thin films deposited by hybrid reactive-HiPIMS plus ECWR and reactive-HiPIMS magnetron plasma system
- 1.Hubička, Zdeněk - Zlámal, M. - Olejníček, Jiří - Tvarog, Drahoslav - Čada, Martin - Krýsa, J.
Semiconducting p-type copper iron oxide thin films deposited by hybrid reactive-HiPIMS plus ECWR and reactive-HiPIMS magnetron plasma system.
Coatings. Roč. 10, č. 3 (2020), s. 1-14, č. článku 232. E-ISSN 2079-6412
OECD category: Materials engineering
Impact factor: 2.881, year: 2020
Method of publishing: Open access
http://hdl.handle.net/11104/0310408
Number of the records: 1