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High-rate reactive deposition of transparent SiO.sub.2./sub. films containing low amount of Zr from molten magnetron target

  1. 1.
    Musil, Jindřich - Satava, V. - Baroch, P.
    High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target.
    Thin Solid Films. Roč. 519, č. 2 (2010), s. 775-777. ISSN 0040-6090. E-ISSN 1879-2731
    Impact factor: 1.909, year: 2010
    http://hdl.handle.net/11104/0241059
Number of the records: 1  

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