In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu.sub.2./sub.O.sub.3./sub.

Irimiciuc, Stefan - More Chevalier, Joris - Chertopalov, Sergii - Fekete, Ladislav - Novotný, Michal - Havlová, Šárka - Poupon, Morgane - Zikmund, Tomáš - Kůsová, Kateřina - Lančok, Ján
In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu₂O₃.
Applied Physics B-Lasers and Optics. Roč. 127, č. 10 (2021), č. článku 140. ISSN 0946-2171. E-ISSN 1432-0649
OECD category: Coating and films
Impact factor: 2.171, year: 2021
Method of publishing: Limited access
https://doi.org/10.1007/s00340-021-07689-4
http://hdl.handle.net/11104/0322752