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Double hollow cathode plasma jet-low temperature method for the TiO.sub.2-x./sub.N.sub.x./sub. photoresponding films

  1. 1.
    Kment, Štěpán - Klusoň, Petr - Hubička, Zdeněk - Krýsa, J. - Čada, Martin - Gregora, Ivan - Deyneka, Alexander - Remeš, Zdeněk - Žabová, Hana - Jastrabík, Lubomír
    Double hollow cathode plasma jet-low temperature method for the TiO2-xNx photoresponding films.
    Electrochimica acta. Roč. 55, č. 5 (2010), s. 1548-1556. ISSN 0013-4686. E-ISSN 1873-3859
    Impact factor: 3.642, year: 2010
    http://hdl.handle.net/11104/0187508
Number of the records: 1  

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