Number of the records: 1
Conjugated Silicon–Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes
- 1.Schauer, F. - Schauer, Petr - Kuřitka, I. - Hua, B.
Conjugated Silicon–Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes.
Materials Transactions. Roč. 51, č. 2 (2010), s. 197-201. ISSN 1345-9678. E-ISSN 1347-5320
Impact factor: 0.779, year: 2010
http://hdl.handle.net/11104/0184761
Number of the records: 1