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Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition
- 1.Červenka, Jiří - Ledinský, Martin - Stuchlíková, The-Ha - Stuchlík, Jiří - Výborný, Zdeněk - Holovský, Jakub - Hruška, Karel - Fejfar, Antonín - Kočka, Jan
Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition.
Physica Status Solidi. Roč. 4, 1-2 (2010), s. 37-39. ISSN 1862-6254. E-ISSN 1862-6270
Impact factor: 2.660, year: 2010
http://www3.interscience.wiley.com/cgi-bin/fulltext/123213957/HTMLSTART
http://hdl.handle.net/11104/0184509
Number of the records: 1