Number of the records: 1
Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges
- 1.0373839 - FZÚ 2012 RIV DE eng J - Journal Article
Straňák, V. - Wulff, H. - Bogdanowicz, R. - Drache, S. - Hubička, Zdeněk - Čada, Martin - Tichý, M. - Hippler, R.
Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges.
European Physical Journal D. Roč. 64, 2-3 (2011), 427-435. ISSN 1434-6060. E-ISSN 1434-6079
R&D Projects: GA ČR(CZ) GAP205/11/0386; GA ČR GP202/09/P159; GA AV ČR KAN301370701; GA MŠMT(CZ) 1M06002
Grant - others:AVČR(CZ) M100100915
Institutional research plan: CEZ:AV0Z10100522
Keywords : dual magnetron * Ti-Cu film * HiPIMS * diagnostics * ion energy
Subject RIV: BH - Optics, Masers, Lasers
Impact factor: 1.476, year: 2011
Permanent Link: http://hdl.handle.net/11104/0206899
Number of the records: 1