Number of the records: 1
Comparison between chemical and plasmatic treatment of seeding layer for patterned diamond growth
- 1.0355161 - FZÚ 2011 RIV US eng C - Conference Paper (international conference)
Kromka, Alexander - Babchenko, Oleg - Rezek, Bohuslav - Hruška, Karel - Purkrt, A. - Remeš, Zdeněk
Comparison between chemical and plasmatic treatment of seeding layer for patterned diamond growth.
Diamond Electronics and Bioelectronics - Fundamentals to Applications III. Warrendale, PA: Materials Research Society, 2010 - (Bergonzo, P.; Butler, J.; Jackman, R.; Loh, K.; Nesladek, M.), s. 137-143. MRS Symposium Proceedings, Vol. 1203. ISBN 978-1-60511-176-6.
[MRS Fall Meeting 2009. Boston (US), 30.11.2009-04.12.2009]
R&D Projects: GA MŠMT LC510; GA AV ČR(CZ) IAAX00100902; GA AV ČR KAN400100701; GA AV ČR(CZ) KAN400480701
Institutional research plan: CEZ:AV0Z10100521
Keywords : diamond * plasma-enhanced CVD (PECVD) (deposition) * microstructure
Subject RIV: BM - Solid Matter Physics ; Magnetism
http://dx.doi.org/10.1557/PROC-1203-J17-53
Permanent Link: http://hdl.handle.net/11104/0193993
Number of the records: 1