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Enhancement of YBCO thin film thermal stability under 1 ATM oxygen pressure by Intermediate Cu.sub.2./sub. O nanolayer

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    0347871 - FZÚ 2011 RIV US eng J - Journal Article
    Cheng, L. - Wang, X. - Yao, X. - Wan, W. - Li, F.H. - Xiong, J. - Tao, B.W. - Jirsa, Miloš
    Enhancement of YBCO thin film thermal stability under 1 ATM oxygen pressure by Intermediate Cu2 O nanolayer.
    Journal of Physical Chemistry B. Roč. 114, č. 22 (2010), s. 7543-7547. ISSN 1520-6106. E-ISSN 1520-5207
    R&D Projects: GA MŠMT(CZ) ME10069
    Institutional research plan: CEZ:AV0Z10100520
    Keywords : YBCO thin films * thermal stability * thin film growth orientation * temperature optical microscopy
    Subject RIV: BM - Solid Matter Physics ; Magnetism
    Impact factor: 3.603, year: 2010

    Permanent Link: http://hdl.handle.net/11104/0006036
     
Number of the records: 1  

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