Number of the records: 1
Conjugated Silicon–Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes
- 1.0341918 - ÚPT 2011 RIV JP eng J - Journal Article
Schauer, F. - Schauer, Petr - Kuřitka, I. - Hua, B.
Conjugated Silicon–Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes.
Materials Transactions. Roč. 51, č. 2 (2010), s. 197-201. ISSN 1345-9678. E-ISSN 1347-5320
R&D Projects: GA AV ČR IAA100100622
Institutional research plan: CEZ:AV0Z20650511
Keywords : ultra violet degradability * polysilylenes * weak bond * conformation defect * nanorezists
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 0.779, year: 2010
Permanent Link: http://hdl.handle.net/11104/0184761
Number of the records: 1