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Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition
- 1.0341570 - FZÚ 2011 RIV DE eng J - Journal Article
Červenka, Jiří - Ledinský, Martin - Stuchlíková, The-Ha - Stuchlík, Jiří - Výborný, Zdeněk - Holovský, Jakub - Hruška, Karel - Fejfar, Antonín - Kočka, Jan
Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition.
Physica Status Solidi. Roč. 4, 1-2 (2010), s. 37-39. ISSN 1862-6254. E-ISSN 1862-6270
R&D Projects: GA MŠMT(CZ) LC06040; GA AV ČR KAN400100701; GA MŠMT LC510
Institutional research plan: CEZ:AV0Z10100521
Keywords : nanowires * silicon * scanning electron microscopy * hemical vapor deposition * Raman spectroscopy
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 2.660, year: 2010
http://www3.interscience.wiley.com/cgi-bin/fulltext/123213957/HTMLSTART
Permanent Link: http://hdl.handle.net/11104/0184509
Number of the records: 1