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Crystallographic properties of grain size-controlled polycrystalline silicon thin films deposited on alumina substrate

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    0324621 - FZÚ 2009 RIV NL eng J - Journal Article
    Ogane, A. - Honda, Shinya - Uraoka, Y. - Fuyuki, T. - Fejfar, Antonín - Kočka, Jan
    Crystallographic properties of grain size-controlled polycrystalline silicon thin films deposited on alumina substrate.
    [Krystalografické vlastnosti tenkých vrstev polykrystalického křemíku s řízenou velikostí zrna na safírových podložkách.]
    Journal of Crystal Growth. Roč. 311, č. 3 (2009), s. 789-793. ISSN 0022-0248. E-ISSN 1873-5002
    Institutional research plan: CEZ:AV0Z10100521
    Keywords : crystallites * defects * chemical vapor deposition processes * solar cells
    Subject RIV: BM - Solid Matter Physics ; Magnetism
    Impact factor: 1.534, year: 2009

    Permanent Link: http://hdl.handle.net/11104/0172268
     
Number of the records: 1  

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