Number of the records: 1
Quantitative depth profiling of K-doped fullerene films using XPS and SIMS
- 1.0031295 - ÚFCH JH 2006 AT eng J - Journal Article
Oswald, S. - Janda, Pavel - Dunsch, L.
Quantitative depth profiling of K-doped fullerene films using XPS and SIMS.
Microchimica Acta. Roč. 141, 1-2 (2003), s. 79-85. ISSN 0026-3672. E-ISSN 1436-5073
Institutional research plan: CEZ:AV0Z4040901
Keywords : XPS * SIMS * depth profiling * fullerenes * doping
Subject RIV: CG - Electrochemistry
Impact factor: 1.050, year: 2001
Permanent Link: http://hdl.handle.net/11104/0132039
Number of the records: 1