High-rate reactive deposition of transparent SiO.sub.2./sub. films containing low amount of Zr from molten magnetron target

0437497 - FZÚ 2015 RIV CH eng J - Journal Article
Musil, Jindřich - Satava, V. - Baroch, P.
High-rate reactive deposition of transparent SiO₂ films containing low amount of Zr from molten magnetron target.
Thin Solid Films. Roč. 519, č. 2 (2010), s. 775-777. ISSN 0040-6090. E-ISSN 1879-2731
Institutional research plan: CEZ:AV0Z10100520
Keywords : sputtering * evaporation * reactive deposition * target power density
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.909, year: 2010
Permanent Link: http://hdl.handle.net/11104/0241059