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The Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil
- 1.0390196 - ÚCHP 2013 RIV US eng J - Journal Article
Morozová, Magdalena - Klusoň, Petr - Dzik, P. - Veselý, M. - Baudyš, M. - Krýsa, J. - Šolcová, Olga
The Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil.
Journal of Sol-Gel Science and Technology. Roč. 65, č. 3 (2013), s. 452-458. ISSN 0928-0707. E-ISSN 1573-4846
R&D Projects: GA TA ČR TA01020804
Grant - others:GA ČR(CZ) GP104/09/P165
Institutional support: RVO:67985858
Keywords : titanium dioxide * photoelectrochemical properties * deposition techniques
Subject RIV: CI - Industrial Chemistry, Chemical Engineering
Impact factor: 1.547, year: 2013
Permanent Link: http://hdl.handle.net/11104/0219712File Download Size Commentary Version Access SKMBT_C22013040212570.pdf 6 3.6 MB Author´s preprint open-access
Number of the records: 1