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The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition
- 1.0352722 - FZÚ 2011 RIV GB eng J - Journal Article
Červenka, Jiří - Ledinský, Martin - Stuchlík, Jiří - Stuchlíková, The-Ha - Bakardjieva, Snejana - Hruška, Karel - Fejfar, Antonín - Kočka, Jan
The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition.
Nanotechnology. Roč. 21, č. 41 (2010), 415604/1-415604/7. ISSN 0957-4484. E-ISSN 1361-6528
R&D Projects: GA MŠMT(CZ) LC06040; GA AV ČR KAN400100701; GA MŠMT LC510
EU Projects: European Commission(XE) 240826 - PolySiMode
Institutional research plan: CEZ:AV0Z10100521; CEZ:AV0Z40320502
Keywords : nanoneedles * nanowires * silicon * plasma * chemical vapor deposition * crystal structure * growth * phonon * SEM * Raman
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 3.644, year: 2010
Permanent Link: http://hdl.handle.net/11104/0192169
Number of the records: 1