Number of the records: 1
Direct measurements of the ion flux at the substrate in reactive HiPIMS
SYS 0464208 LBL 01000a^^22220027750^450 005 20240103212809.7 017 $2 DOI 100 $a 20161024d m y slo 03 ba 101 $a eng 102 $a DE 200 1-
$a Direct measurements of the ion flux at the substrate in reactive HiPIMS 215 $a 1 s. $c E 463 -1
$1 001 cav_un_epca*0464210 $1 200 1 $a International Conference on Plasma Surface Engineering. Abstracts. ( PSE 2016 ) /15./ $v S. 415-415 $1 210 $a Braunschweig $c European Joint Committee on Plasma and Ion Surface Engineering (EJC / PISE) $d 2016 610 $a HiPIMS 610 $a impedance 610 $a ion flux 610 $a reactive sputtering 700 -1
$3 cav_un_auth*0100168 $a Čada $b Martin $i Nízkoteplotní plazma $j Low-Temperature Plasma $p FZU-D $w Low-Temperature Plasma $T Fyzikální ústav AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0302435 $a Lundin $b D. $y FR 701 -1
$3 cav_un_auth*0100245 $a Hubička $b Zdeněk $i Nízkoteplotní plazma $j Low-Temperature Plasma $p FZU-D $w Low-Temperature Plasma $T Fyzikální ústav AV ČR, v. v. i.
Number of the records: 1