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The effects of pulse frequency on chemical species formation in a nanosecond pulsed plasma gas-liquid film reactor
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$a 10.34343/ijpest.2020.14.e01008 $2 DOI 100 $a 20210322d m y slo 03 ba 101 $a eng 102 $a JP 200 1-
$a The effects of pulse frequency on chemical species formation in a nanosecond pulsed plasma gas-liquid film reactor 215 $a 9 s. 463 -1
$1 001 cav_un_epca*0541266 $1 011 $a 1881-8692 $1 200 1 $a International Journal of Plasma Environmental Science and Technology $v Roč. 14, č. 1 (2020), s. 1-9 $1 210 $c Seidenki Gakkai 608 $a Article 610 $a Filamentary discharge 610 $a Hydrogen peroxide 610 $a Nanosecond discharge 610 $a Non-thermal plasma 610 $a Pulse frequency 610 $a Wet plasma 700 -1
$3 cav_un_auth*0407436 $a Wandell $b R. J. $y US $q Florida State University 701 -1
$3 cav_un_auth*0376220 $a Bresch $b D. $y FR 701 -1
$3 cav_un_auth*0086563 $a Wang $b H. $y US $q Florida State University 701 -1
$3 cav_un_auth*0101352 $a Babický $b Václav $p UFP-V $i Impulsní plazmové systémy $j Pulse Plasma Systems $k IPS $l PPS $y CZ $T Ústav fyziky plazmatu AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0101396 $a Lukeš $b Petr $p UFP-V $i Impulsní plazmové systémy $j Pulse Plasma Systems $k IPS $l PPS $y CZ $T Ústav fyziky plazmatu AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0017361 $a Locke $b B. R. $y US $q Florida State University 856 $u http://ijpest.com/Contents/14/1/e01008.html $9 RIV
Number of the records: 1