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Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
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$a 10.1016/j.cattod.2018.11.034 $2 DOI 100 $a 20191129d m y slo 03 ba 101 0-
$a eng 102 $a NL 200 1-
$a Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering 215 $a 6 s. 463 -1
$1 001 cav_un_epca*0256354 $1 011 $a 0920-5861 $e 1873-4308 $1 200 1 $a Catalysis Today $v Roč. 328, May (2019), s. 29-34 $1 210 $c Elsevier 608 $a Article 608 $a Proceedings Paper 610 $a high power impulse magnetron sputtering 610 $a reactive sputtering 610 $a magnetron discharge 610 $a photocathode 610 $a photocurrent 610 $a copper oxide 700 -1
$3 cav_un_auth*0100245 $a Hubička $b Zdeněk $p FZU-D $i Nízkoteplotní plazma $j Low-Temperature Plasma $w Low-Temperature Plasma $z K $T Fyzikální ústav AV ČR, v. v. i. 701 -1
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$3 cav_un_auth*0100168 $a Čada $b Martin $p FZU-D $i Nízkoteplotní plazma $j Low-Temperature Plasma $w Low-Temperature Plasma $T Fyzikální ústav AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0234460 $a Kment $b Štěpán $p FZU-D $i Nízkoteplotní plazma $j Low-Temperature Plasma $w Low-Temperature Plasma $y CZ $T Fyzikální ústav AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0312380 $a Krysa $b J. $y CZ 856 $9 RIV $u https://doi.org/10.1016/j.cattod.2018.11.034
Number of the records: 1