Number of the records: 1  

Study of thermal recrystallisation in Si implanted by 0.4-MeV heavy ions

  1. SYS0508842
    LBL
      
    01000a^^22220027750^450
    005
      
    20240103222613.6
    014
      
    $a 85071871905 $2 SCOPUS
    014
      
    $a 000484715100001 $2 WOS
    017
      
    $a 10.1002/sia.6698 $2 DOI
    100
      
    $a 20190925d m y slo 03 ba
    101
      
    $a eng $d eng
    102
      
    $a US
    200
    1-
    $a Study of thermal recrystallisation in Si implanted by 0.4-MeV heavy ions
    215
      
    $a 8 s. $c P
    463
    -1
    $1 001 cav_un_epca*0257629 $1 011 $a 0142-2421 $e 1096-9918 $1 200 1 $a Surface and Interface Analysis $v Roč. 51, č. 11 (2019), s. 1113-1120 $1 210 $c Wiley
    610
      
    $a ion implantation of Si
    610
      
    $a ion channelling in a crystal material
    610
      
    $a heavy ions implantation
    610
      
    $a structural modification of an ion-implanted silicon crystal
    700
    -1
    $3 cav_un_auth*0267048 $a Mikšová $b Romana $p UJF-V $i Oddělení neutronové fyziky $j Department of Neutron Physics $k ONF $w Research with Beams of Ions and Neutrons $T Ústav jaderné fyziky AV ČR, v. v. i.
    701
    -1
    $3 cav_un_auth*0277086 $a Horák $b Pavel $p UJF-V $i Oddělení neutronové fyziky $j Department of Neutron Physics $k ONF $w Research with Beams of Ions and Neutrons $y CZ $T Ústav jaderné fyziky AV ČR, v. v. i.
    701
    -1
    $3 cav_un_auth*0047083 $a Holý $b V. $y CZ
    701
    -1
    $3 cav_un_auth*0100958 $a Macková $b Anna $p UJF-V $i Oddělení neutronové fyziky $j Department of Neutron Physics $k ONF $w Research with Beams of Ions and Neutrons $T Ústav jaderné fyziky AV ČR, v. v. i.
    856
      
    $9 RIV $u https://doi.org/10.1002/sia.6698
Number of the records: 1  

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