Number of the records: 1
Deposition of Organosilicon Polymer Thin Films by Plasma Enhanced Chemical Vapor Deposition
SYS 0047572 LBL 01514^^^^^2200337^^^450 005 20240103183214.8 100 $a 20070103d m y slo 03 ba 101 0-
$a eng $d eng 102 $a CZ 200 1-
$a Deposition of Organosilicon Polymer Thin Films by Plasma Enhanced Chemical Vapor Deposition 210 $a Pardubice $c Univerzita Pardubice $d 2006 215 $a 4 s. 541 1-
$a Depozice organosilikonových tenkých vrstev pomocí PECVD $z cze 610 0-
$a organosilicon polymers 610 0-
$a PECVD 610 0-
$a surface analyses 700 -1
$3 cav_un_auth*0020799 $a Zajíčková $b L. $y CZ $4 070 701 -1
$3 cav_un_auth*0015844 $a Buršíková $b V. $y CZ $4 070 701 -1
$3 cav_un_auth*0022063 $a Sťahel $b P. $y CZ $4 070 701 -1
$3 cav_un_auth*0101245 $a Buršík $b Jiří $p UFM-A $w Structure of Phases and Thermodynamics Group $4 070 $T Ústav fyziky materiálů AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0100985 $a Peřina $b Vratislav $p UJF-V $w Research with Beams of Ions and Neutrons $4 070 $T Ústav jaderné fyziky AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0100958 $a Macková $b Anna $p UJF-V $w Research with Beams of Ions and Neutrons $4 070 $T Ústav jaderné fyziky AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0220412 $a Dubroka $b A. $y CZ $4 070
Number of the records: 1