Number of the records: 1
Quantitative depth profiling of K-doped fullerene films using XPS and SIMS
SYS 0031295 LBL 01859^^^^^2200253^^^450 005 20240103182407.4 100 $a 20060316d m y slo 03 ba 101 0-
$a eng 102 $a AT 200 1-
$a Quantitative depth profiling of K-doped fullerene films using XPS and SIMS 215 $a 7 s. 463 -1
$1 001 cav_un_epca*0257259 $1 011 $a 0026-3672 $e 1436-5073 $1 200 1 $a Microchimica Acta $v Roč. 141, 1-2 (2003), s. 79-85 $1 205 $a PRINT $1 210 $c Springer 610 0-
$a XPS 610 0-
$a SIMS 610 0-
$a depth profiling 610 0-
$a fullerenes 610 0-
$a doping 700 -1
$3 cav_un_auth*0213989 $a Oswald $b S. $y DE $4 070 701 -1
$3 cav_un_auth*0102810 $a Janda $b Pavel $p UFCH-W $w Electrochemical Materials $4 070 $T Ústav fyzikální chemie Jaroslava Heyrovského AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0017234 $a Dunsch $b L. $y DE $4 070
Number of the records: 1