Number of the records: 1
Advances in chemical lift-off lithography
- 1.Cheung, K., Goronzy, D. P., Stemer, D., Zhao, C., Young, T., Belling, J., Baše, T., Andrews, A., Weiss, P. Advances in chemical lift-off lithography. Abstracts of papers - American Chemical Society. 2019, 258(AUG), 277-ANYL. ISSN 0065-7727.
Number of the records: 1