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Semiconducting p-type copper iron oxide thin films deposited by hybrid reactive-HiPIMS plus ECWR and reactive-HiPIMS magnetron plasma system
- 1.Hubička, Z., Zlámal, M., Olejníček, J., Tvarog, D., Čada, M., Krýsa, J. Semiconducting p-type copper iron oxide thin films deposited by hybrid reactive-HiPIMS plus ECWR and reactive-HiPIMS magnetron plasma system. Coatings. 2020, 10(3), 1-14), 232. E-ISSN 2079-6412. Available: doi: 10.3390/coatings10030232.
Number of the records: 1