Number of the records: 1  

Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering

  1. 1.
    Hubička, Z., Zlámal, M., Čada, M., Kment, Š., Krysa, J. Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering. Catalysis Today. 2019, 328(May), 29-34. ISSN 0920-5861. E-ISSN 1873-4308. Available: doi: 10.1016/j.cattod.2018.11.034.
Number of the records: 1  

  This site uses cookies to make them easier to browse. Learn more about how we use cookies.