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Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold
- 1.Makhotkin, I.A., Milov, I., Chalupský, J., Tiedtke, K., Enkisch, H., de Vries, G., Scholze, F., Siewert, F., Sturm, J.M., Nikolaev, K., van de Kruijs, R.W.E., Smithers, M.A., van Wolferen, H.A.G.M., Keim, E.G., Louis, E., Jacyna, I., Jurek, M., Klinger, D., Pelka, J. B., Juha, L., Hájková, V., Vozda, V., Burian, T., Saksl, K., Faatz, B., Keitel, B., Ploenjes, E., Schreiber, S., Toleikis, S., Loch, R., Hermann, M., Strobel, S., Donker, R., Mey, T., Sobierajski, R. Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold. Journal of the Optical Society of America. B. 2018, 35(11), 2799-2805. ISSN 0740-3224. E-ISSN 1520-8540. Available: doi: 10.1364/JOSAB.35.002799
Number of the records: 1