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The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition
- 1.Červenka, J., Ledinský, M., Stuchlík, J., Stuchlíková, T.-H., Bakardjieva, S., Hruška, K., Fejfar, A., Kočka, J. The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition. Nanotechnology. 2010, 21(41), 415604/1-415604/7. ISSN 0957-4484. E-ISSN 1361-6528. Available: doi: 10.1088/0957-4484/21/41/415604
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