Sub-micron focusing of soft x-ray free electron laser beam

Bajt, S., Chapman, H.N., Nelson, A.J., Lee, R. W., Toleikis, S., Mirkarimi, P., Alameda, J.B., Baker, S. L., Vollmer, H., Graff, R.T., Aquila, A., Gullikson, E.M., Meyer Ilse, J., Spiller, E.A., Krzywinski, J., Juha, L., Chalupský, J., Hájková, V., Hajdu, J., Tschentscher, T. Sub-micron focusing of soft x-ray free electron laser beam. In: JUHA, L., BAJT, S., SOBIERAJSKI, R., eds. Damage to VUV, EUV, and X-ray Optics II. Bellingham: SPIE, 2009, 73610J/1-73610J/10. Proceedings of SPIE, 7361. ISBN 9780819476357. ISSN 0277-786x. Available: http://dx.doi.org/10.1117/12.822498