Improved efficiency of materials processing by dual action of XUV/Vis-NIR ultrashort laser pulses and comprehensive study of high-order harmonic source at PALS

Jakubczak, K., Mocek, T., Rus, B., Hřebíček, J., Sawicka, M., Kim, I. J., Park, S.B., Kim, T.K., Lee, G.H., Nam, C. H., Chalupský, J., Hájková, V., Juha, L., Sobota, J., Fořt, T. Improved efficiency of materials processing by dual action of XUV/Vis-NIR ultrashort laser pulses and comprehensive study of high-order harmonic source at PALS. In: KHOUNSARY, A.M., MORAWE, C., GOTO, S., eds. Advances in X-Ray/EUV Optics and Components IV. Bellingham: SPIE, 2009, 736010/1-736010/11. Proceedings of SPIE, 7448. ISBN 978-0-8194-7738-5. ISSN 0277-786X. Available: http://dx.doi.org/10.1117/12.826404