Copper nitride thin films prepared by the RF plasma chemical reactor with low pressure supersonic single and multi-plasma jet system

Soukup, L., Šícha, M., Fendrych, F., Jastrabík, L., Hubička, Z., Chvostová, D., Šíchová, H., Valvoda, V., Tarasenko, A. A., Studnička, V., Wagner, T., Novák, M. Copper nitride thin films prepared by the RF plasma chemical reactor with low pressure supersonic single and multi-plasma jet system. Surface and Coatings Technology. 1999, 116-119(-), 321-326. ISSN 0257-8972.