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Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses
- 1.MOCEK, T., JAKUBCZAK, K., KOZLOVÁ, M., POLAN, J., HOMER, P., HŘEBÍČEK, J., SAWICKA, M., KIM, I. J., PARK, S.B., KIM, C. M., LEE, G.H., KIM, T.K., NAM, C. H., CHALUPSKÝ, J., HÁJKOVÁ, V., JUHA, L., SOBOTA, J., FOŘT, T., RUS, B. Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses. Radiation Effects and Defects in Solids. 2010, 165(6-10), 551-558. ISSN 1042-0150. E-ISSN 1029-4953. Available: doi: 10.1080/10420151003722867
Number of the records: 1