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Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition
- 1.ČERVENKA, J., LEDINSKÝ, M., STUCHLÍKOVÁ, T.-H., STUCHLÍK, J., VÝBORNÝ, Z., HOLOVSKÝ, J., HRUŠKA, K., FEJFAR, A., KOČKA, J. Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition. Physica Status Solidi. 2010, 4(1-2), 37-39. ISSN 1862-6254. E-ISSN 1862-6270. Available: doi: 10.1002/pssr.200903348.
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