Double hollow cathode plasma jet-low temperature method for the TiO.sub.2-x./sub.N.sub.x./sub. photoresponding films

KMENT, Štěpán, KLUSOŇ, Petr, HUBIČKA, Zdeněk, KRÝSA, J., ČADA, Martin, GREGORA, Ivan, DEYNEKA, Alexander, REMEŠ, Zdeněk, ŽABOVÁ, Hana, JASTRABÍK, Lubomír. Double hollow cathode plasma jet-low temperature method for the TiO_2-xN_x photoresponding films. Electrochimica acta. 2010, 55(5), 1548-1556. ISSN 0013-4686. E-ISSN 1873-3859. Available: doi: 10.1016/j.electacta.2009.10.017