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Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition
- 1.ČERVENKA, Jiří, LEDINSKÝ, Martin, STUCHLÍKOVÁ, The-Ha, STUCHLÍK, Jiří, VÝBORNÝ, Zdeněk, HOLOVSKÝ, Jakub, HRUŠKA, Karel, FEJFAR, Antonín, KOČKA, Jan. Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition. Physica Status Solidi. 2010, 4(1-2), 37-39. ISSN 1862-6254. E-ISSN 1862-6270. Available: doi: 10.1002/pssr.200903348.
Number of the records: 1