Number of the records: 1
Influence of process parameters on the properties of TEOS DF-PECVD grown SiO2 films by DOE
- 1.MIKMEKOVÁ, Eliška, JANČA, J., DVOŘÁKOVÁ, M. Influence of process parameters on the properties of TEOS DF-PECVD grown SiO2 films by DOE. In: MC 2009 - Microscopy Conference: First Joint Meeting of Dreiländertagung and Multinational Conference on Microscopy. Graz: Verlag der Technischen Universität, 2009, Vol. 3: 463-464. ISBN 978-3-85125-062-6. Available: http://www.univie.ac.at/asem/Graz_MC_09/papers/65557.pdf
Number of the records: 1