Surface stoichiometry and depth profile of Ti.sub.x./sub.-Cu.sub.y./sub.N.sub.z./sub. thin films deposited by magnetron sputtering

0552187 - FZÚ 2022 RIV CH eng J - Journal Article
Mukhopadhyay, A.K. - Roy, A. - Bhattacharjee, G. - Das, S.C. - Majumdar, A. - Wulff, H. - Hippler, Rainer
Surface stoichiometry and depth profile of Ti_x-Cu_yN_z thin films deposited by magnetron sputtering.
Materials. Roč. 14, č. 12 (2021), č. článku 3191. E-ISSN 1996-1944
Institutional support: RVO:68378271
Keywords : magnetron sputtering * Ti-Cu-N coating * N incorporation * X-ray photoelectron spectroscopy * X-ray diffraction * transmission electron microscopy
OECD category: Fluids and plasma physics (including surface physics)
Impact factor: 3.748, year: 2021
Method of publishing: Open access

We report the surface stoichiometry of Tix-CuyNz thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investigated by X-ray photoelectron spectroscopy (XPS). At a larger depth, the relative composition of Cu and Ti in the film is increased compared to the surface. The amount of adventitious carbon which is present on the film surface strongly decreases with film depth. Deposited films also contain a significant amount of oxygen whose origin is not fully clear. Grazing incidence X-ray diffraction (GIXD) shows a Cu3N phase on the surface, while transmission electron microscopy (TEM) indicates a polycrystalline structure and the presence of a Ti3CuN phase.
Permanent Link: http://hdl.handle.net/11104/0327392