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Nanoparticles Personal Exposure Measurement Using a Novel Active Personal Nanoparticle Sampler During Machining and Weldind of Nanomaterials.

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    SYSNO ASEP0510720
    Document TypeC - Proceedings Paper (int. conf.)
    R&D Document TypeConference Paper
    TitleNanoparticles Personal Exposure Measurement Using a Novel Active Personal Nanoparticle Sampler During Machining and Weldind of Nanomaterials.
    Author(s) Ondráčková, Lucie (UCHP-M) RID, ORCID, SAI
    Vlčková, Lucia (UCHP-M)
    Ondráček, Jakub (UCHP-M) RID, ORCID, SAI
    Schwarz, Jaroslav (UCHP-M) RID, ORCID, SAI
    Ždímal, Vladimír (UCHP-M) RID, ORCID, SAI
    Source TitleSborník XX. výroční konference České aerosolové společnosti, pp.. - Praha : Česká aerosolová společnost, 2019 - ISBN 978-80-270-6416-8
    Pagess. 100-101
    Number of pages2 s.
    Publication formPrint - P
    ActionVýroční konference České aerosolové společnosti /20./
    Event date30.10.2019 - 01.11.2019
    VEvent locationVelké Bílovice
    CountryCZ - Czech Republic
    Event typeEUR
    Languageeng - English
    CountryCZ - Czech Republic
    Keywordspersonal nanoparticle sampler (PENS) ; workplace exposure ; mass concentration
    Subject RIVDN - Health Impact of the Environment Quality
    OECD categoryPublic and environmental health
    R&D ProjectsGA18-02079S GA ČR - Czech Science Foundation (CSF)
    Institutional supportUCHP-M - RVO:67985858
    AnnotationDevelopment of nanotechnology has grown very rapidly in past decades. Therefore, it has become increasingly important to monitor the exposure of workers in nanoparticle-based manufacturing operations. In order to determine real personal exposure, it is advisable to take a sample within the worker’s breathing zone. To perform this task, there is not much of a choice yet, since experimental methods are still under development. Recently, a novel active personal nanoparticle sampler (PENS) has been developed, collecting both respirable mass fraction (RPM) and nanoparticles (NPs) simultaneously.
    WorkplaceInstitute of Chemical Process Fundamentals
    ContactEva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227
    Year of Publishing2020
    Electronic addresshttp://hdl.handle.net/11104/0301122
Number of the records: 1  

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