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Impact of Si doping in different GaN layers on luminescence properties of InGaN/GaN multiple quantum well structure

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    SYSNO ASEP0496160
    Document TypeA - Abstract
    R&D Document TypeO - Ostatní
    TitleImpact of Si doping in different GaN layers on luminescence properties of InGaN/GaN multiple quantum well structure
    Author(s) Hájek, František (FZU-D) ORCID
    Zíková, Markéta (FZU-D) RID
    Hospodková, Alice (FZU-D) RID, ORCID, SAI
    Hubáček, Tomáš (FZU-D) ORCID
    Oswald, Jiří (FZU-D) RID, ORCID
    Number of authors5
    Source TitleProceedings of the International Symposium on Growth of III-Nitrides ISGN-7. - : University of Warsaw, 2018
    S. 125-125
    Number of pages1 s.
    ActionInternational Symposium on Growth of III-Nitrides ISGN-7
    Event date05.08.2018 - 10.08.2018
    VEvent locationWarsaw
    CountryPL - Poland
    Event typeWRD
    Languageeng - English
    CountryPL - Poland
    KeywordsInGaN/GaN ; quantum wells ; doping ; luminescence
    Subject RIVBM - Solid Matter Physics ; Magnetism
    OECD categoryCondensed matter physics (including formerly solid state physics, supercond.)
    R&D ProjectsGA16-11769S GA ČR - Czech Science Foundation (CSF)
    LO1603 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Institutional supportFZU-D - RVO:68378271
    AnnotationLuminescence properties of InGaN/GaN multiple quantum wells (MQWs) are influenced by internal spontaneous and piezoelectric fields. These can be at least partially suppressed by doping with shallow impurities. This work shows impact of Si doping in different layers of MQWs on photoluminescence and cathodoluminescence of InGaN/GaN MQWs. To explain observed trends, band structure is also simulated. From our results emerges demand for Si doping at least under MQW area to obtain higher luminescence intensities. On the other hand, such doping also enhances unwanted defect luminescence which is detrimental for using InGaN MQWs as scintillation material.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2019
Number of the records: 1  

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