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Deposition and forming of nanoparticles on the hydrogenated silicon thin films
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SYSNO ASEP 0483632 Document Type A - Abstract R&D Document Type O - Ostatní Title Deposition and forming of nanoparticles on the hydrogenated silicon thin films Author(s) Stuchlík, Jiří (FZU-D) RID, ORCID
Fajgar, Radek (UCHP-M) RID, ORCID, SAI
Kupčík, Jaroslav (UCHP-M) RID, ORCID, SAI
Stuchlíková, The-Ha (FZU-D) RID, ORCID
Ledinský, Martin (FZU-D) RID, ORCID, SAI
Čermák, Jan (FZU-D) RID, SAI, ORCID
Píč, Vlastimil (FZU-D)
Remeš, Zdeněk (FZU-D) RID, ORCID
Mortet, Vincent (FZU-D) RID, ORCID
Shklyaev, A.A. (RU)
Volodin, V. (RU)Number of authors 11 Source Title E-MRS 2017 Spring Meeting and Exhibit. - Strasbourg : European Materials Research Society, 2017 Number of pages 1 s. Publication form Online - E Action E-MRS 2017 Spring Meeting and Exhibit Event date 22.05.2017 - 26.05.2017 VEvent location Strasbourg Country FR - France Event type WRD Language eng - English Country FR - France Keywords nanoparticles ; hydrogen ; silicon Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Condensed matter physics (including formerly solid state physics, supercond.) Subject RIV - cooperation Institute of Chemical Process Fundamentals
Institute of Chemical Process Fundamentals - Physical ; Theoretical ChemistryR&D Projects GC16-10429J GA ČR - Czech Science Foundation (CSF) LM2015087 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GA13-31783S GA ČR - Czech Science Foundation (CSF) Institutional support FZU-D - RVO:68378271 ; UCHP-M - RVO:67985858 Annotation Thin films prepared by deposition of nanoparticles on the surface of hydrogenated silicon were studied for optoelectronic applications. Three techniques were used to prepare the nanoparticles – high vacuum evaporation resp. MBE and ArF laser ablation. Broad range of deposition conditions (e.g. precursor pressure, temperature and laser fluence) was studied. Interesting and utilizable optoelectronic properties were observed at multilayered films composed of different nanoparticles. Research was focused on preparation of magnesium silicide, calcium silicide, germanium and tin nanoparticles. The nanoparticles were deposited immediately after deposition of the hydrogenated silicon layer by plasma enhanced CVD without exposing the underlying layer to ambient air. The deposited material was characterized by means of Raman and photoelectron spectroscopy techniques. Transmission, scanning and atomic force microscopies were used for more detailed description of the prepared layers. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2018
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