Number of the records: 1  

Deposition and forming of nanoparticles on the hydrogenated silicon thin films

  1. 1.
    SYSNO ASEP0483632
    Document TypeA - Abstract
    R&D Document TypeO - Ostatní
    TitleDeposition and forming of nanoparticles on the hydrogenated silicon thin films
    Author(s) Stuchlík, Jiří (FZU-D) RID, ORCID
    Fajgar, Radek (UCHP-M) RID, ORCID, SAI
    Kupčík, Jaroslav (UCHP-M) RID, ORCID, SAI
    Stuchlíková, The-Ha (FZU-D) RID, ORCID
    Ledinský, Martin (FZU-D) RID, ORCID, SAI
    Čermák, Jan (FZU-D) RID, SAI, ORCID
    Píč, Vlastimil (FZU-D)
    Remeš, Zdeněk (FZU-D) RID, ORCID
    Mortet, Vincent (FZU-D) RID, ORCID
    Shklyaev, A.A. (RU)
    Volodin, V. (RU)
    Number of authors11
    Source TitleE-MRS 2017 Spring Meeting and Exhibit. - Strasbourg : European Materials Research Society, 2017
    Number of pages1 s.
    Publication formOnline - E
    ActionE-MRS 2017 Spring Meeting and Exhibit
    Event date22.05.2017 - 26.05.2017
    VEvent locationStrasbourg
    CountryFR - France
    Event typeWRD
    Languageeng - English
    CountryFR - France
    Keywordsnanoparticles ; hydrogen ; silicon
    Subject RIVBM - Solid Matter Physics ; Magnetism
    OECD categoryCondensed matter physics (including formerly solid state physics, supercond.)
    Subject RIV - cooperationInstitute of Chemical Process Fundamentals
    Institute of Chemical Process Fundamentals - Physical ; Theoretical Chemistry
    R&D ProjectsGC16-10429J GA ČR - Czech Science Foundation (CSF)
    LM2015087 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    GA13-31783S GA ČR - Czech Science Foundation (CSF)
    Institutional supportFZU-D - RVO:68378271 ; UCHP-M - RVO:67985858
    AnnotationThin films prepared by deposition of nanoparticles on the surface of hydrogenated silicon were studied for optoelectronic applications. Three techniques were used to prepare the nanoparticles – high vacuum evaporation resp. MBE and ArF laser ablation. Broad range of deposition conditions (e.g. precursor pressure, temperature and laser fluence) was studied. Interesting and utilizable optoelectronic properties were observed at multilayered films composed of different nanoparticles. Research was focused on preparation of magnesium silicide, calcium silicide, germanium and tin nanoparticles. The nanoparticles were deposited immediately after deposition of the hydrogenated silicon layer by plasma enhanced CVD without exposing the underlying layer to ambient air. The deposited material was characterized by means of Raman and photoelectron spectroscopy techniques. Transmission, scanning and atomic force microscopies were used for more detailed description of the prepared layers.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2018
Number of the records: 1  

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