Direct measurements of the ion flux at the substrate in reactive HiPIMS

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SYSNO	0464208
Title	Direct measurements of the ion flux at the substrate in reactive HiPIMS
Author(s)	Čada, Martin (FZU-D)_{RID, ORCID, SAI} Lundin, D. (FR) Hubička, Zdeněk (FZU-D)_{RID, ORCID, SAI}
Source Title	International Conference on Plasma Surface Engineering. Abstracts. ( PSE 2016 ) /15./. S. 415-415. - Braunschweig : European Joint Committee on Plasma and Ion Surface Engineering (EJC / PISE), 2016
Conference	International Conference on Plasma Surface Engineering ( PSE 2016 ), 12.09.2016 - 16.09.2016, Garmisch-Partenkirchen
Document Type	Abstrakt
Grant	GA15-00863S GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic
	TA03010743 GA TA ČR - Technology Agency of the Czech Republic (TA ČR)
	608800, XE - EU countries
Institutional support	FZU-D - RVO:68378271
Language	eng
Country	DE
Keywords	HiPIMS * impedance * ion flux * reactive sputtering
Permanent Link	http://hdl.handle.net/11104/0263191

Number of the records: 1