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Direct measurements of the ion flux at the substrate in reactive HiPIMS
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SYSNO ASEP 0464208 Document Type A - Abstract R&D Document Type O - Ostatní Title Direct measurements of the ion flux at the substrate in reactive HiPIMS Author(s) Čada, Martin (FZU-D) RID, ORCID, SAI
Lundin, D. (FR)
Hubička, Zdeněk (FZU-D) RID, ORCID, SAISource Title International Conference on Plasma Surface Engineering. Abstracts. ( PSE 2016 ) /15./. - Braunschweig : European Joint Committee on Plasma and Ion Surface Engineering (EJC / PISE), 2016
S. 415-415Number of pages 1 s. Publication form Online - E Action International Conference on Plasma Surface Engineering ( PSE 2016 ) Event date 12.09.2016 - 16.09.2016 VEvent location Garmisch-Partenkirchen Country DE - Germany Event type WRD Language eng - English Country DE - Germany Keywords HiPIMS ; impedance ; ion flux ; reactive sputtering Subject RIV BL - Plasma and Gas Discharge Physics R&D Projects GA15-00863S GA ČR - Czech Science Foundation (CSF) TA03010743 GA TA ČR - Technology Agency of the Czech Republic (TA ČR) Institutional support FZU-D - RVO:68378271 Annotation A direct measurement of the ion flux impinging on the substrate during ionized physical vapour deposition is valuable input when optimizing thin film deposition processes such as High-Power Impulse magnetron sputtering. However, these measurements are often complicated by the fact that they require expensive diagnostic equipment. For that reason an innovative approach consisting of an extension of a quartz crystal microbalance (QCM) sensor has been investigated in the present contribution. On top of deposition rate, the modified QCM is able to measure ionized fraction of depositing particles and ion flux on the substrate. Recently reported results proved that magnets placed at the top of the QCM sensor are able to significantly reduce electron current on the positively biased electrode attached to the crystal and in this way measure only the deposition rate of neutral particles. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2017
Number of the records: 1