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Investigating the thin film growth of [Ni(Hvanox).sub.2./sub.] by microscopic and spectroscopic techniques

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    SYSNO ASEP0618377
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleInvestigating the thin film growth of [Ni(Hvanox)2] by microscopic and spectroscopic techniques
    Author(s) Sapre, Atharva Umesh (FZU-D) ORCID
    Vlček, Jan (FZU-D) RID, ORCID
    de Prado, Esther (FZU-D) ORCID, RID
    Fekete, Ladislav (FZU-D) RID, ORCID
    Klementová, Mariana (FZU-D) RID, ORCID
    Vondráček, Martin (FZU-D) RID, ORCID
    Svora, Petr (FZU-D) ORCID
    Cuza, E. (IE)
    Morgan, G.G. (IE)
    Honolka, Jan (FZU-D) RID, ORCID
    Kühne, Irina A. (FZU-D) ORCID
    Number of authors11
    Article number2083
    Source TitleNanoscale Advances. - : Royal Society of Chemistry - ISSN 2516-0230
    Roč. 7, Feb (2025)
    Number of pages9 s.
    Languageeng - English
    CountryGB - United Kingdom
    Keywordsthin film ; AFM ; SEM ; TEM ; XRD ; 3D electron diffraction
    Subject RIVBM - Solid Matter Physics ; Magnetism
    OECD categoryCondensed matter physics (including formerly solid state physics, supercond.)
    R&D ProjectsGA23-05878S GA ČR - Czech Science Foundation (CSF)
    EH22_008/0004596 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    LM2023051 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Method of publishingOpen access
    Institutional supportFZU-D - RVO:68378271
    UT WOS001426865500001
    EID SCOPUS85219074946
    DOI https://doi.org/10.1039/d4na01021c
    AnnotationWe have investigated [Ni(Hvanox)2] (H2vanox = o-vanillinoxime), a square-planar Ni(II) complex, for the preparation of thin films using organic molecule evaporation. Low pressure experiments to prepare thin films were conducted at temperatures between 120–150 °C and thin films of increasing thicknesses [Ni(Hvanox)2] (16–336 nm) have been prepared on various substrates and been analyzed by microscopic and spectroscopic methods. Scanning electron microscopy (SEM), atomic force microscopy (AFM) and transmission electron microscopy (TEM) were used to reveal a rough surface morphology which exhibits a dense arrangement of elongated, rod and needle-like nanocrystals with random orientations. It also enabled us to follow the growth of the thin films by increasing thickness revealing the formation of a seeding layer. X-ray photoelectron spectroscopy (XPS and 3D ED), TEM and X-ray diffraction (XRD) were utilized to confirm the atomic structure and the elemental composition of the thin films.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2026
    Electronic addresshttps://hdl.handle.net/11104/0365240
Number of the records: 1  

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