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Photo-degradation pathways of selected antibiotics degraded by visible light over g-C3N4 thin film in photomicroreactor
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SYSNO ASEP 0598098 Document Type A - Abstract R&D Document Type The record was not marked in the RIV R&D Document Type Není vybrán druh dokumentu Title Photo-degradation pathways of selected antibiotics degraded by visible light over g-C3N4 thin film in photomicroreactor Author(s) Schimon, Dominik (UCHP-M)
Klusoň, Petr (UCHP-M) RID, ORCID, SAI
Dzik, P. (CZ)
Homola, T. (CZ)
Stavárek, Petr (UCHP-M) RID, ORCID, SAIArticle number 0382 Source Title Author Index. - Prague : Czech Society of Chemical Engineering, 2024
B4.4Number of pages 2 s. Publication form Online - E Action International Congress of Chemical and Process Engineering CHISA 2024 /27./ Event date 25.08.2024 - 29.08.2024 VEvent location Prague Country CZ - Czech Republic Event type EUR Language eng - English Country CZ - Czech Republic Keywords photocatalysis ; carbon nitride ; antibiotics OECD category Chemical process engineering R&D Projects GA23-06843S GA ČR - Czech Science Foundation (CSF) Institutional support UCHP-M - RVO:67985858 Annotation In this study, g-C3N4 was synthesized through the calcination of a supramolecular complex comprising melamine and cyanuric acid at 550°C in nitrogen atmosphere, yielding g-C3N4 with enhanced photocatalytic activity. Films of g-C3N4 were then prepared using a mixture of ball-milled g-C3N4 and a polysiloxane binder. These thin films, with an average thickness of 27 μm, underwent surface modification through plasma treatment to enhance hydrophilic properties. The resulting photocatalytic films were tested in a photomicroreactor (PMR) featuring a slit geometry and results were compared to tests conducted in a batch photoreactor (BPR) with photocatalysts in form of a slurry. Rhodamine B (RhB), a fluorescent dye, was used as a reference substance, further the study focused on the degradation of two specific antibiotics, tetracycline (TC) and trimethoprim (TMP), as emerging wastewater pollutants. Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2025
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