Microstructure and physical properties of black-aluminum antireflective films

Correa, Cinthia Antunes; More Chevalier, Joris; Hruška, Petr; Poupon, Morgane; Novotný, Michal; Minárik, P.; Hubík, Pavel; Lukáč, František; Fekete, Ladislav; Prokop, Dejan; Hanuš, J.; Valenta, J.; Fitl, Přemysl; Lančok, Ján

doi:https://dx.doi.org/10.1039/D4RA00396A

Number of the records: 1

Microstructure and physical properties of black-aluminum antireflective films

1.

SYSNO ASEP	0585771
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Microstructure and physical properties of black-aluminum antireflective films
Author(s)	Correa, Cinthia Antunes (FZU-D)_ORCID More Chevalier, Joris (FZU-D)_{ORCID, RID} Hruška, Petr (FZU-D)_ORCID Poupon, Morgane (FZU-D)_{ORCID, RID} Novotný, Michal (FZU-D)_{RID, ORCID, SAI} Minárik, P. (CZ) Hubík, Pavel (FZU-D)_{RID, ORCID} Lukáč, František (UFP-V)_ORCID Fekete, Ladislav (FZU-D)_{RID, ORCID} Prokop, Dejan (FZU-D)_{ORCID, RID} Hanuš, J. (CZ) Valenta, J. (CZ) Fitl, Přemysl (FZU-D)_{RID, ORCID} Lančok, Ján (FZU-D)_{RID, ORCID}
Number of authors	14
Source Title	RSC Advances. - : Royal Society of Chemistry - ISSN 2046-2069 Roč. 14, May (2024), s. 15220-15231
Number of pages	12 s.
Language	eng - English
Country	GB - United Kingdom
Keywords	thin film ; aluminum ; antireflective film
Subject RIV	BM - Solid Matter Physics ; Magnetism
OECD category	Condensed matter physics (including formerly solid state physics, supercond.)
Subject RIV - cooperation	Institute of Plasma Physics - Metallurgy
R&D Projects	GA23-05002S GA ČR - Czech Science Foundation (CSF)
	LM2023051 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
	EH22_008/0004596 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
Method of publishing	Open access
Institutional support	FZU-D - RVO:68378271 ; UFP-V - RVO:61389021
UT WOS	001217905700001
EID SCOPUS	85192932879
DOI	https://doi.org/10.1039/D4RA00396A
Annotation	The microstructure and physical properties of reflective and black aluminum were compared for layers of different thicknesses deposited by magnetron sputtering on fused silica substrates. Reflective Al layers followed the Volmer–Weber growth mechanism classically observed for polycrystalline metal films. On the contrary, the extra nitrogen gas used to deposit the black aluminum layers modified the growth mechanism and changed the film morphologies. Nitrogen cumulated in the grain boundaries, favoring the pinning effect and stopping crystallite growth. High defect concentration, especially vacancies, led to strong columnar growth. Properties reported for black aluminum tend to be promising for sensors and emissivity applications.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2025
Electronic address	https://hdl.handle.net/11104/0353450

Number of the records: 1