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High deposition rate films prepared by reactive HiPIMS
- 1.MAREŠ, P., DUBAU, M., POLÁŠEK, J., MATES, Tomáš, KOZÁK, T., VYSKOČIL, J. High deposition rate films prepared by reactive HiPIMS. Vacuum. 2021, 191(Sep), 110329. ISSN 0042-207X. E-ISSN 1879-2715. Dostupné z: https://doi.org/10.1016/j.vacuum.2021.110329.
Number of the records: 1