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Copper tungsten oxide (Cu.sub.x./sub.WO.sub.y./sub.) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering

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    SYSNO0566773
    TitleCopper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering
    Author(s) Hrubantová, Aneta (FZU-D) ORCID
    Hippler, Rainer (FZU-D) ORCID
    Wulff, H. (DE)
    Čada, Martin (FZU-D) RID, ORCID, SAI
    Gedeon, O. (CZ)
    Jiříček, Petr (FZU-D) RID, ORCID, SAI
    Houdková, Jana (FZU-D) RID, ORCID
    Olejníček, Jiří (FZU-D) RID, ORCID
    Nepomniashchaia, Natalia (FZU-D) ORCID
    Helm, C.A. (DE)
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Corespondence/seniorHippler, Rainer - Korespondující autor
    Source Title Journal of Applied Physics. Roč. 132, č. 21 (2022). - : AIP Publishing
    Article number215301
    Document TypeČlánek v odborném periodiku
    Grant CZ.02.1.01/0.0/0.0/16_019/0000760, XE - EU countries
    EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS), CZ - Czech Republic
    GA21-04477S GA ČR - Czech Science Foundation (CSF), CZ - Czech Republic
    Institutional supportFZU-D - RVO:68378271
    Languageeng
    CountryUS
    Keywords HiPIMS * sputtering * photoelectrochemical activity * FTO glass * film properties
    URLhttps://hdl.handle.net/11104/0338068
    Permanent Linkhttps://hdl.handle.net/11104/0338068
    FileDownloadSizeCommentaryVersionAccess
    0566773.pdf03.5 MBCC licencePublisher’s postprintopen-access
     
Number of the records: 1  

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