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Surface stoichiometry and depth profile of Ti.sub.x./sub.-Cu.sub.y./sub.N.sub.z./sub. thin films deposited by magnetron sputtering
- 1.MUKHOPADHYAY, A.K., ROY, A., BHATTACHARJEE, G., DAS, S.C., MAJUMDAR, A., WULFF, H., HIPPLER, R. Surface stoichiometry and depth profile of Tix-CuyNz thin films deposited by magnetron sputtering. Materials. 2021, 14(12), 3191. ISSN 1996-1944. E-ISSN 1996-1944. Available: https://doi.org/10.3390/ma14123191.
Number of the records: 1