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In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu.sub.2./sub.O.sub.3./sub.
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SYSNO ASEP 0546180 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu2O3 Author(s) Irimiciuc, Stefan Andrei (FZU-D) ORCID
More Chevalier, Joris (FZU-D) ORCID
Chertopalov, Sergii (FZU-D) ORCID, RID
Fekete, Ladislav (FZU-D) RID, ORCID
Novotný, Michal (FZU-D) RID, ORCID, SAI
Havlová, Šárka (FZU-D) ORCID
Poupon, Morgane (FZU-D) ORCID, RID
Zikmund, Tomáš (FZU-D)
Kůsová, Kateřina (FZU-D) RID, ORCID
Lančok, Ján (FZU-D) RID, ORCIDNumber of authors 10 Article number 140 Source Title Applied Physics B-Lasers and Optics. - : Springer - ISSN 0946-2171
Roč. 127, č. 10 (2021)Number of pages 9 s. Language eng - English Country DE - Germany Keywords expansion ; dynamics ; ablation ; target ; oxides Subject RIV BL - Plasma and Gas Discharge Physics OECD category Coating and films R&D Projects EF16_019/0000760 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) GA18-17834S GA ČR - Czech Science Foundation (CSF) Method of publishing Limited access Institutional support FZU-D - RVO:68378271 UT WOS 000696523600001 EID SCOPUS 85115095563 DOI https://doi.org/10.1007/s00340-021-07689-4 Annotation The control and arguably the tailoring aspect of technologies like pulsed laser deposition (PLD) rises from understanding the chemistry hidden by the laser generated plasma. With the continuous transition towards thin films with complex structures and geometries, the comprehension of the fundamental processes during the film deposition becomes critical. During the PLD of Mo and Eu-doped Lu2O3, optical emission spectroscopy was implemented for in-situ plasma monitoring. The spatial distribution of individual elements revealed the structuring of a stoichiometric plasma while the formation of LuO molecule within the plasma plume is seen as being induced by the addition of a minimum 1 Pa of O2. The energy of the ejected particles was controlled through doping and O2 pressure. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2022 Electronic address https://doi.org/10.1007/s00340-021-07689-4
Number of the records: 1